DIFFER-PLD

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Dutch Institute for Fundamental Energy Research – PLD

TA36 – DIFFER-PLD 

Location

De Zaale 20

5612AJ Eindhoven,  Netherlands 

Description

The RI “PLD4Energy” is a vacuum cluster line for thin film deposition and in-situ characterisation. PLD stands for Pulsed Laser Deposition. The vacuum cluster line consists of two PLD chambers (1 inch and up to 4 inch) and one sputter chamber (3 sources for 2 and 4 inch) to deposit metal oxide and metal thin films. The two PLD chambers are operated by the same laser and have the same vacuum chamber so that upscaling of PLD processes is possible. Thin film depositions can be carried out between room temperatures of up to 900°C. Materials screening experiments are possible. The PLD chambers are surrounded by in-situ diagnostics, such as RHEED, OES, LAXS, IR, MOSS. An XPS tool is connected to the vacuum line and a vacuum suitcase allows transferring of samples to other research infrastructures.

Testing Capabilities

Testing capabilities include thin film deposition (metal oxides, metals incl. materials screening, high and low temperature) and in-situ characterisation (RHEED, OES, XPS, LAXS, IR, stress).

Technical Equipment

From 2026:

  • Two PLD chambers (1 and up to 4 inch) including RHEED and OES, and 1 sputter chamber (up to 4 inch).

From 2027:

  • In-situ XPS (X-ray photoelectron spectroscopy).

From 2028:  

  • In-situ x-ray analysis and other spectroscopic methods.

Additional information

Technology Readiness Level: 1-3

Special considerations: N/A 

Technology clusters: Energy Storage, Hydrogen, Information and Communication Technologies, Materials for Energy, PV

Website: http://www.differ.nl/facilities

Availability: All year

Provision of tools to prepare data sets in a FAIR way:  Yes 

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